发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 A semiconductor device includes an electrode (electrode pad), an insulation film (for example, protective resin film) formed over the electrode and having an opening for exposing the electrode. The semiconductor device further includes an under bump metal (UBM layer) formed over the insulation film and connected by way of the opening 5a to the electrode, and a solder ball formed over the under bump metal. In the under bump metal, a thickness A for the first portion situated in the opening above the electrode and the thickness B for the second portion situated in the under bump metal at the periphery of the opening over the insulation film are in a condition: A/B≧1.5, and the opening and the solder ball are in one to one correspondence.
申请公布号 US2012248605(A1) 申请公布日期 2012.10.04
申请号 US201213404715 申请日期 2012.02.24
申请人 YAMAGUCHI TOSHIHIDE;RENESAS ELECTRONICS CORPORATION 发明人 YAMAGUCHI TOSHIHIDE
分类号 H01L23/498;H01L21/768 主分类号 H01L23/498
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