发明名称 |
APPARATUS FOR DELIVERING A PROCESS GAS |
摘要 |
A processing system for delivering a process gas to a reaction chamber using a recipe having a recipe flow rate is provided. The processing system includes a gas flow delivery system configured for delivering the process gas, wherein said gas flow delivery system controlled by a mass flow controller (MFC) to an orifice. The predicted flow rate is previously computed by pressurizing a gas. The predicted flow rate further being previously computed measuring a set of upstream pressure values of the gas via at least one sensor. The processing system also includes a programmed computing device configured for applying a calibration factor of a set of calibration factors to determine the predicted flow rate, the calibration factor being a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values. |
申请公布号 |
US2012247581(A1) |
申请公布日期 |
2012.10.04 |
申请号 |
US201213436705 |
申请日期 |
2012.03.30 |
申请人 |
SHAREEF IQBAL A.;TIETZ JAMES V.;WONG VERMON;MEINECKE RICHARD J. |
发明人 |
SHAREEF IQBAL A.;TIETZ JAMES V.;WONG VERMON;MEINECKE RICHARD J. |
分类号 |
F16K21/00 |
主分类号 |
F16K21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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