发明名称 |
VERTICAL TYPE THIN FILM DEPOSITION APPARATUS WITH A FUNCTION OF IMPROVED FILM UNIFORMITY |
摘要 |
PURPOSE: A vertical thin film deposition apparatus for improving film uniformity is provided to uniformly form a thin film on the front, rear, and peripheral surfaces of objects to be deposited by rotating the objects in order to change the contact points to a driving part. CONSTITUTION: A vertical thin film deposition apparatus for improving film uniformity comprises a reaction part(100), a reactive gas supply part, an exhaust gas discharge part, a heating part(200), and a driving part(300). The reaction part comprises a plurality of reaction cavities(112) in which disk-shaped deposited materials are installed in an upright position, respectively. The reactive gas supply part individually supplies reactive gas into the reaction cavities. The exhaust gas discharge part is installed at the other side of the reactive gas supply part and discharges gas to outside. The heating part heats objects to be deposited. The driving part supports and rotates the objects accommodated in the reaction cavities.
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申请公布号 |
KR20120107806(A) |
申请公布日期 |
2012.10.04 |
申请号 |
KR20110025550 |
申请日期 |
2011.03.22 |
申请人 |
SEMIMATERIALS. CO., LTD.;PARK, KUN |
发明人 |
PARK, JONG HOON;LEE, GUN TEK;WOO, JI HOON;PARK, SUNG EUN;PARK, KUN |
分类号 |
C23C16/44;C23C16/458;C23C16/46;H01L21/205 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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