| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for detecting positions of a mask surface and a plate surface accurately, by detecting a position detection mark at a position affected as scarcely as possible by astigmatic difference at a projection optical system, when position detection is performed on the mask surface and the plate surface through the projection optical system in an exposure device. <P>SOLUTION: An exposure device (100) comprises: a projection optical system (30) for forming an image of a pattern formed on an object surface (11), on an image surface (21); and a position detection unit (50) which has a wavelength different from an exposure wavelength and detects a relative displacement amount between the object surface and the image surface through the projection optical system. Accuracy of position detection is improved by performing the position detection at a position scarcely affected by astigmatic difference generated at the projection optical system (30). <P>COPYRIGHT: (C)2013,JPO&INPIT |
