发明名称 METHODS FOR BONDING SEMICONDUCTOR STRUCTURES INVOLVING ANNEALING PROCESSES, AND BONDED SEMICONDUCTOR STRUCTURES AND INTERMEDIATE STRUCTURES FORMED USING SUCH METHODS
摘要 Methods of bonding together semiconductor structures include annealing metal of a feature on a semiconductor structure prior to directly bonding the feature to a metal feature of another semiconductor structure to form a bonded metal structure, and annealing the bonded metal structure after the bonding process. The thermal budget of the first annealing process may be at least as high as a thermal budget of a later annealing process. Additional methods involve forming a void in a metal feature, and annealing the metal feature to expand the metal of the feature into the void. Bonded semiconductor structures and intermediate structures are formed using such methods.
申请公布号 WO2012130730(A1) 申请公布日期 2012.10.04
申请号 WO2012EP55119 申请日期 2012.03.22
申请人 SOITEC;SADAKA, MARIAM;RADU, IONUT;LANDRU, DIDIER 发明人 SADAKA, MARIAM;RADU, IONUT;LANDRU, DIDIER
分类号 H01L21/60;H01L23/485 主分类号 H01L21/60
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