发明名称 MEASUREMENT OF THE POSITION OF A RADIATION BEAM SPOT IN LITHOGRAPHY
摘要 <p>A radiation spot measurement system for a lithographic apparatus, the system having a target (40) onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target (42). The system further includes a radiation detector (41) to detect radiation from one of the spots, and a controller (46) to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.</p>
申请公布号 WO2012130532(A1) 申请公布日期 2012.10.04
申请号 WO2012EP52984 申请日期 2012.02.22
申请人 ASML NETHERLANDS B.V.;PEETERS, FELIX;BENSCHOP, JOZEF;RENKENS, MICHAEL;VAN BAARS, GREGOR;DEKKERS, JEROEN 发明人 PEETERS, FELIX;BENSCHOP, JOZEF;RENKENS, MICHAEL;VAN BAARS, GREGOR;DEKKERS, JEROEN
分类号 G03F7/20 主分类号 G03F7/20
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