| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide novel, wet developable anti-reflective coating compositions; and to provide methods of using those compositions. <P>SOLUTION: The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker and a photoacid generator. The acid functional group is a carboxylic acid, while the crosslinker is a vinyl ether crosslinker. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light, the cured compositions will decrosslink, rendering them soluble in typical photoresist developing solutions (e.g., alkaline developers). <P>COPYRIGHT: (C)2013,JPO&INPIT |
