发明名称 PROCESSING METHOD OF PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a processing method of a photosensitive lithographic printing plate in which excellent printing contamination resistance can be obtained if liquid exchange is not performed for a long period. <P>SOLUTION: Provided is a processing method of a photosensitive lithographic printing plate that includes a photopolymerizable photosensitive layer on a substrate and includes an oxygen intercepting layer on a side further away from the substrate than the photopolymerizable photosensitive layer, in which the photosensitive lithographic printing plate is processed with a process liquid containing polyvinyl alcohol decomposing bacteria. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012189781(A) 申请公布日期 2012.10.04
申请号 JP20110052911 申请日期 2011.03.10
申请人 MITSUBISHI PAPER MILLS LTD 发明人 SEIYAMA HIDEO
分类号 G03F7/00;G03F7/11;G03F7/30 主分类号 G03F7/00
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