发明名称 |
PROCESSING METHOD OF PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a processing method of a photosensitive lithographic printing plate in which excellent printing contamination resistance can be obtained if liquid exchange is not performed for a long period. <P>SOLUTION: Provided is a processing method of a photosensitive lithographic printing plate that includes a photopolymerizable photosensitive layer on a substrate and includes an oxygen intercepting layer on a side further away from the substrate than the photopolymerizable photosensitive layer, in which the photosensitive lithographic printing plate is processed with a process liquid containing polyvinyl alcohol decomposing bacteria. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2012189781(A) |
申请公布日期 |
2012.10.04 |
申请号 |
JP20110052911 |
申请日期 |
2011.03.10 |
申请人 |
MITSUBISHI PAPER MILLS LTD |
发明人 |
SEIYAMA HIDEO |
分类号 |
G03F7/00;G03F7/11;G03F7/30 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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