发明名称 |
CHARGE TRAP INSULATOR MEMORY DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology which improves a maintenance characteristics of a nanoscale charge trap insulator memory unit device and increases a cell integrated capacity by a large number of charge trap insulator cell arrays laminated to the vertical direction with the use of multiple of cell insulator layers. <P>SOLUTION: The device is composed of: multiple of upper word lines and lower word lines; multiple of bit lines and sensing lines; multiple of memory cell arrays arranged in an intersection region of the upper and lower word lines and bit lines; multiple of memory cells which output storage data from a charge trap insulator to bit lines; a first switching element and a second switching element which selectively and respectively connect the memory cells to bit lines and sensing lines; a P-type float channel whose resistance varies according to a polarity of the charge strap insulator and P-type drain area and P-type source area formed on both sides of the P-type float channel. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2012191227(A) |
申请公布日期 |
2012.10.04 |
申请号 |
JP20120119068 |
申请日期 |
2012.05.24 |
申请人 |
SK HYNIX INC |
发明人 |
KANG HEE BOK;AHN JIN HONG;LEE JAE JIN |
分类号 |
H01L27/115;G11C16/04;H01L21/336;H01L21/8247;H01L27/28;H01L29/788;H01L29/792;H01L51/05 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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