发明名称 |
PLASMA PROCESSING APPARATUS AND PLASMA GENERATION ANTENNA |
摘要 |
A plasma generation antenna and a plasma processing apparatus can supply a gas and an electromagnetic wave effectively. A plasma processing apparatus 10 includes a processing chamber 100 in which a plasma process is performed; a wavelength shortening plate 480 configured to transmit an electromagnetic wave; and a plasma generation antenna 200 having a shower head 210 provided adjacent to the wavelength shortening plate 480. The shower head 210 is made of a conductor, and has a multiple number of gas holes 215 and a multiple number of slots 220 through which the electromagnetic wave passes. The slots 220 are provided at positions isolated from the gas holes 215.
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申请公布号 |
US2012247675(A1) |
申请公布日期 |
2012.10.04 |
申请号 |
US201213435552 |
申请日期 |
2012.03.30 |
申请人 |
IKEDA TARO;KOMATSU TOMOHITO;KASAI SHIGERU;TOKYO ELECTRON LIMITED |
发明人 |
IKEDA TARO;KOMATSU TOMOHITO;KASAI SHIGERU |
分类号 |
H01L21/3065;H01Q13/10 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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