| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress occurrence of uneven residual film by pressing a surface coated with a hardening resin with a uniform pressure, in nanoimprint where a mesa-structure mold and/or a processed substrate is used. <P>SOLUTION: In the nanoimprint method, gas is introduced into a pressure vessel 110 while supporting an assembly 8, which is in such a state that the entire surface can be exposed directly to an atmosphere, by means of a support member 140 in the pressure vessel 110 so that the fluid pressure P due to the atmosphere acts substantially on the entire surface of the assembly 8, and a mold 1 and a processed substrate 7 are pressed each other by the fluid pressure P of the gas. <P>COPYRIGHT: (C)2013,JPO&INPIT |
