发明名称 |
CYCLIC COMPOUND, METHOD OF PRODUCING THE SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD OF FORMING RESIST PATTERN |
摘要 |
This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition.
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申请公布号 |
US2012251947(A1) |
申请公布日期 |
2012.10.04 |
申请号 |
US201013500715 |
申请日期 |
2010.09.27 |
申请人 |
HAYASHI HIROMI;ECHIGO MASATOSHI;OGURO DAI |
发明人 |
HAYASHI HIROMI;ECHIGO MASATOSHI;OGURO DAI |
分类号 |
C07C39/17;C07C37/00;C07C47/36;C07D319/06;G03F7/027;G03F7/20 |
主分类号 |
C07C39/17 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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