| 摘要 |
The present invention provides a trivalent chromium plating solution that has industrially satisfactory thickness and that is capable of forming chromium plating with excellent corrosion resistance, abrasion resistance, and other film properties. This trivalent chromium plating solution includes a trivalent chromium compound, a pH buffer, an amino carboxylic acid compound, a sulfamic acid salt compound, and an aminocarbonyl compound. The plating solution preferably furthermore includes ceramic particles. A ceramic particle dispersing agent is also preferably included. |
