发明名称 |
METHOD OF CLEANING FILM FORMING APPARATUS, FILM FORMING METHOD, AND FILM FORMING APPARATUS |
摘要 |
Plasma is generated on the first condition between a cathode electrode and an anode electrode. Then, plasma is generated on the second condition different from the first condition. The second condition is for spreading plasma between the cathode electrode and the anode electrode in the outer peripheral direction as compared with the first condition. Accordingly, in addition to a deposit on the electrode, a deposit on the member provided in the vicinity of the outer periphery of the electrode can be immediately removed. |
申请公布号 |
US2012251723(A1) |
申请公布日期 |
2012.10.04 |
申请号 |
US201013514851 |
申请日期 |
2010.12.08 |
申请人 |
KISHIMOTO KATSUSHI;ISSHIKI KAZUHIKO |
发明人 |
KISHIMOTO KATSUSHI;ISSHIKI KAZUHIKO |
分类号 |
B08B7/00;C23C16/22;C23C16/503 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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