METHOD FOR DETECTING EFFECTIVE POWER DEVIATIONS IN MICROWAVES IN PLASMA PROCESSING DEVICES, AND PLASMA PROCESSING DEVICE

摘要

This method finds effective power deviations in microwaves that arise among a plurality of plasma processing devices. Processing gas is supplied at a prescribed pressure to an evacuated processing vessel (12) and the vessel sealed. Microwaves are introduced into the sealed processing vessel at a prescribed electric power, and gas plasma for processing is generated. The change in the pressure in the processing vessel before plasma generation and the pressure in the processing vessel after plasma generation is measured, and the effective power deviation for the microwaves in the plasma processing device and the other plasma processing device is found on the basis of a correlative relation for the variation width for the pressure in another plasma processing device that is found in advance and forms a standard and the electric power for supplying the microwaves.