发明名称 |
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION |
摘要 |
<p>Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) containing an acid-decomposable repeating unit (A), which resin when acted on by an acid, increases its solubility in an alkali developer, a compound (Q) that when exposed to actinic rays or radiation, generates an acid, and a compound (R) expressed by general formula (1) or (2) below.</p> |
申请公布号 |
WO2012133939(A1) |
申请公布日期 |
2012.10.04 |
申请号 |
WO2012JP59300 |
申请日期 |
2012.03.29 |
申请人 |
FUJIFILM CORPORATION;TAKAHASHI, TOSHIYA;TAKIZAWA, HIROO;TSUBAKI, HIDEAKI;HIRANO, SHUJI;TSUCHIMURA, TOMOTAKA |
发明人 |
TAKAHASHI, TOSHIYA;TAKIZAWA, HIROO;TSUBAKI, HIDEAKI;HIRANO, SHUJI;TSUCHIMURA, TOMOTAKA |
分类号 |
G03F7/039;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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