| 摘要 |
<p>This film forming apparatus is provided with a vacuum chamber (100), a substrate holder (5) that holds a substrate (6) inside the vacuum chamber (100), a target (2) that contains a film forming material and has a main surface inclined with respect to a main surface of the substrate (6), and an angle correcting plate (12) that is outside of a spatial region (30) encompassed by line segments (31, 32) that link the periphery of the main surface of the target (2) and the periphery of the main surface of the substrate and is provided so as to cover the upper part of the main surface of the substrate. Viewing the vacuum chamber (100) from the front, and letting B be random points on the main surface of the substrate and C be at least the center point on the main surface of the target (2), at least a part of the main surface of the angle correcting plate (12) is present on each line forming 45° from each point B to each line joining point B and point C, and the other parts of the main surface of the angle correcting plate (12) extend to the side opposite from the target (2).</p> |
