DEVELOPMENT OF A CONTRAST PHANTOM FOR ACTIVE MILLIMETER WAVE IMAGING SYSTEMS

摘要

A contrast phantom (20; 100; 200; 300; 400) for an active millimeter wave imaging system is made from different materials (47, 48, 49, 37; 111-1 16; 211-216) or sections (311-315; 41 1-415) having different reflectivities. The reflectivities incrementally increase in discrete steps so that the phantom (20; 100; 200) is useable to calibrate the active millimeter wave imaging system. The reflectivities preferably range from 0% to 100% and incrementally and linearly increase in equal steps. A method of producing the contrast phantom (20; 100; 200; 300; 400) for the active millimeter wave imaging system is also described.