发明名称 INORGANIC NANOSTRUCTURE REACTIVE DIRECT-WRITE AND GROWTH
摘要 <p>Methods for forming inorganic nanostructures are provided. The methods create the inorganic nanostructures by positioning a writing electrode (e.g.. a conductive "stamp") spaced nanometers above a substrate such that a precursor is intermediate the two. Applying an electric field, a voltage bias, an ionic current, or an electronic current between the writing electrode and the substrate converts the precursor into an inorganic solid material (e.g., a semiconductor such as silicon or germanium) in the area of the writing electrode.</p>
申请公布号 WO2012135768(A1) 申请公布日期 2012.10.04
申请号 WO2012US31701 申请日期 2012.03.30
申请人 ROLANDI, MARCO;BRASINO, MICHAEL;KAPETANOVIC, ADNAN;TALLA, VAMSI;VASKO, STEPHANIE;SATO, HIDEKI 发明人 ROLANDI, MARCO;BRASINO, MICHAEL;KAPETANOVIC, ADNAN;TALLA, VAMSI;VASKO, STEPHANIE;SATO, HIDEKI
分类号 H01L21/20 主分类号 H01L21/20
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