| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist material, in particular, a chemically amplified positive resist material, which exhibits excellent resolution, coverage and adhesion on a highly reflective stepped substrate portion and gives a good pattern profile and minimal edge roughness after exposure, and thereby, which is particularly suitable as a fine pattern forming material for fabrication of VLSIs or a photomask by EB drawing. <P>SOLUTION: The positive resist material comprises: a polymeric compound having a weight average molecular weight of 1,000 to 500,000 and containing a (meth)acrylate repeating unit in which a hydrogen atom of a carboxyl group is substituted with a cyclic acid labile group; and a dihydroxynaphthalene novolac resin; and a photoacid generator. <P>COPYRIGHT: (C)2013,JPO&INPIT |
