PHOTO-CROSSLINKABLE NAIL VARNISHES FREE OF UNSATURATED MONOMERS

摘要

The invention relates to a photo-crosslinkable cosmetic composition, which is free of reactive monomers with a molecular mass of less than 400 g/mol comprising one or more ethylenic double bonds: - at least one polymer comprising ethylenic double bonds, the mean number of ethylenic double bonds per polymer molecule being greater than 1, the polymer(s)comprising at least one polyether polymer containing (meth)acrylate groups, - at least one film-forming polymer soluble in the polyether polymer(s) containing (meth)acrylate groups and having a molecular mass of less than 20 000 g/mol, - at least one radical photoinitiator, -the said composition comprising less than 5% by weight of solvent relative to the total weight of the composition. The invention also relates to a cosmetic process for coating the nails or false nails using such a composition.