发明名称 Process for synthesizing a thin film or composition layer via non-contact pressure containment
摘要 A process for synthesizing a thin film or composition layer from a plurality of precursor layers supported on a substrate, includes exposing the plurality of precursor layers to non-contact pressure, and heating the plurality of precursor layers under the non-contact pressure to a reaction temperature sufficient to promote the formation of the film or composition layer.
申请公布号 AU2010202792(B2) 申请公布日期 2012.10.04
申请号 AU20100202792 申请日期 2010.03.26
申请人 HELIOVOLT CORPORATION 发明人 SANG, BAOSHENG;ELDADA, LOUAY;LIM, ABNER
分类号 C23C4/18;C23C14/58 主分类号 C23C4/18
代理机构 代理人
主权项
地址
您可能感兴趣的专利