发明名称 |
Process for synthesizing a thin film or composition layer via non-contact pressure containment |
摘要 |
A process for synthesizing a thin film or composition layer from a plurality of precursor layers supported on a substrate, includes exposing the plurality of precursor layers to non-contact pressure, and heating the plurality of precursor layers under the non-contact pressure to a reaction temperature sufficient to promote the formation of the film or composition layer. |
申请公布号 |
AU2010202792(B2) |
申请公布日期 |
2012.10.04 |
申请号 |
AU20100202792 |
申请日期 |
2010.03.26 |
申请人 |
HELIOVOLT CORPORATION |
发明人 |
SANG, BAOSHENG;ELDADA, LOUAY;LIM, ABNER |
分类号 |
C23C4/18;C23C14/58 |
主分类号 |
C23C4/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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