INSULATION PATTERN, FORMATION METHOD FOR THE INSULATION PATTERN, LIGHT-EMITTING DEVICE, MANUFACTURING METHOD FOR THE LIGHT-EMITTING DEVICE, AND ILLUMINATION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for simply forming an insulation pattern having an eaves part by using a single exposure mask, an insulation pattern having an eaves part that can surely divide a thin film, a formation method for the insulation pattern, a light-emitting device to which the insulation pattern is applied, a manufacturing method for the light-emitting device, and an illumination device.

SOLUTION: A method for forming an insulation pattern having an eaves part includes: forming a first organic layer having photosensitivity on a substrate; forming a leg part by exposing a first region to light using an exposure mask; forming a second organic layer having photosensitivity; and forming a base part by exposing a second region, which partly overlaps with the first region, to light plural times while the same exposure mask is displaced in a direction parallel to the substrate. The insulation pattern formed by this method may be applied to a light-emitting device or an illumination device.

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