PROFILE MEASURING APPARATUS, METHOD FOR MEASURING PROFILE, AND METHOD FOR MANUFACTURING STRUCTURE

摘要

A profile measuring apparatus includes: an irradiating unit which is configured to irradiate the measuring object with light from the light source to form a spotted pattern; a scanner which is configured to relatively scan the surface of the measuring object with the spotted pattern; a light receiver which includes a plurality of light-receiving pixels aligned to detect an image of the spotted pattern generated by the light irradiating the measuring object from a different direction different from an irradiation direction of the light irradiating the measuring object; a changing unit which is configured to change positions, at which signals utilized to detect a position of the image of the spotted pattern are obtained, according to the irradiation direction of the light; and a controller which is configured to calculate positional information of the measuring object based on the signals from the light-receiving pixels.