PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD FOR CONTROLLING THE SAME
摘要
There is disclosed a plasma enhanced chemical vapor deposition apparatus including a loading station to load an object on a pallet, an operation station to form a functional film by performing plasma reaction to the object loaded on the pallet, a unloading station to separate the object from the pallet, a circulation station to convey the pallet from the unloading station to the loading station, and a conveyer to convey the pallet to the stations sequentially to circulate the pallet.
申请公布号
WO2012134082(A2)
申请公布日期
2012.10.04
申请号
WO2012KR01898
申请日期
2012.03.16
申请人
LG ELECTRONICS INC.;OH, JUNGGEUN;LEE, KWANGHO;LEE, JANGWOO;KIM, JEONGGYU;SHIN, JINHYOUK