| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device which can achieve high-precision focus position calibration while enhancing the throughput excellently. <P>SOLUTION: A mask side mark 8 for focusing is provided on the surface of a mask 1, a photoelectric sensor 10 is provided on a plate stage 5 and a plate side mark 9 for focusing is provided on the photoelectric sensor 10. The mask side mark 8 for focusing is illuminated with exposure light 7, and a light beam passed through the mask side mark 8 for focusing is made incident onto the photoelectric sensor 10 through a projection optical system 3 and the plate side mark 9 for focusing. Change in the focus position of the projection optical system 3 is detected based on a signal from the photoelectric sensor 10 obtained when the plate stage 5 is shaken on a plane orthogonal to the optical axis direction of the projection optical system 3 and the position signal of the plate stage 5. <P>COPYRIGHT: (C)2013,JPO&INPIT |
