发明名称 |
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN |
摘要 |
A resist composition including: a base component (A) that exhibits changed solubility in a developing solution by action of acid; and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) includes a resin component (A1) containing a structural unit (a0) represented by general formula (a0-1) shown below or general formula (a0-2) shown below; and the acid generator component (B) includes an acid generator (B1) including a compound represented by general formula (b0-1) or (b0-2) shown below:
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申请公布号 |
US2012251951(A1) |
申请公布日期 |
2012.10.04 |
申请号 |
US201213424183 |
申请日期 |
2012.03.19 |
申请人 |
IWASHITA JUN;MATSUZAWA KENSUKE;TOKYO OHKA KOGYO CO., LTD. |
发明人 |
IWASHITA JUN;MATSUZAWA KENSUKE |
分类号 |
G03F7/027;G03F7/20 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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