发明名称 |
SEMICONDUCTOR OPTICAL INTEGRATED CIRCUIT DEVICE, AND METHOD OF MANUFACTURING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor optical integrated circuit device and a method of manufacturing the same capable of achieving both improvement of an absorption efficiency and reduction in an element resistance. <P>SOLUTION: A semiconductor optical integrated circuit device at least has: a waveguide part consisting of a waveguide core layer that is formed on a semiconductor substrate and has at least a mesa shape part; and a photodiode part at least having a first conductivity type spacer layer, an absorption layer, and an upper clad layer having a second conductivity type opposite to the first conductivity type that are sequentially laminated on an extended part of the waveguide core layer. At least a part of the first conductivity type spacer layer is a mesa shape. A first conductivity type semiconductor layer having a refraction index smaller than that of the first conductivity type spacer layer is provided so as to contact with a lateral face of the mesa-shaped first conductivity type spacer layer. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2012190875(A) |
申请公布日期 |
2012.10.04 |
申请号 |
JP20110051019 |
申请日期 |
2011.03.09 |
申请人 |
FUJITSU LTD |
发明人 |
UETAKE MASATO;TAKABAYASHI KAZUMASA |
分类号 |
H01L31/10;G02B6/122;H01L31/0232 |
主分类号 |
H01L31/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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