Thin-film device, method of manufacturing the same, and method of manufacturing image display apparatus

摘要

There is provided a method of manufacturing a thin-film device, the method including forming a first substrate (21) on a supporting base (20) by a coating method, the first substrate being formed by using a resin material; forming a second substrate (22) on the first substrate by using any one of a thermosetting resin and energy ray-curable resin; forming an active element on the second substrate; and removing the supporting base from the first substrate. The resin material used to form the first substrate has a glass transition temperature of at least 180°C.