发明名称 Pattern verification method, pattern verification apparatus, and pattern verification program
摘要 A pattern verification apparatus includes a correction section creating a plurality of first data pieces; a determination section performing light intensity simulation to create a plurality of plots, determine whether or not each of the plurality of simulation result plots falls within an allowable range, and recognize two or more simulation result plots which do not fall within the allowable range as a plurality of second data pieces; an extraction section extracting a reference pattern of the plurality of original design patterns corresponding to the plurality of second data pieces; and a classifying section classifying the plurality of second data pieces into categories of the reference pattern.
申请公布号 US8280147(B2) 申请公布日期 2012.10.02
申请号 US20100700820 申请日期 2010.02.05
申请人 NAOE MITSUFUMI;MIYAUCHI TORU;OKADA TOMOYUKI;MAKINO SEIJI;SUZUKI KOICHI;OHSEKI MASAKAZU;FUJITSU SEMICONDUCTOR LIMITED 发明人 NAOE MITSUFUMI;MIYAUCHI TORU;OKADA TOMOYUKI;MAKINO SEIJI;SUZUKI KOICHI;OHSEKI MASAKAZU
分类号 G06K9/00;G03F1/36;G03F1/68;H01L21/027 主分类号 G06K9/00
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