发明名称 Methods of forming nonvolatile memory devices having vertically integrated nonvolatile memory cell sub-strings therein
摘要 Methods of forming nonvolatile memory devices according to embodiments of the invention include techniques to form highly integrated vertical stacks of nonvolatile memory cells. These vertical stacks of memory cells can utilize dummy memory cells to compensate for process artifacts that would otherwise yield relatively poor functioning memory cell strings when relatively large numbers of memory cells are stacked vertically on a semiconductor substrate using a plurality of vertical sub-strings electrically connected in series.
申请公布号 US8278170(B2) 申请公布日期 2012.10.02
申请号 US201113165576 申请日期 2011.06.21
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE CHANGHYUN;SHIM SUNIL;JANG JAEHOON;HUR SUNGHOI;KIM HANSOO;KIM KIHYUN
分类号 H01L21/336 主分类号 H01L21/336
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