发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
An immersion lithographic apparatus is provided with an electrode set to remove unwanted droplets of an immersion fluid from a particular surface. Unwanted droplets of immersion fluid may form on any number of different surfaces of the immersion apparatus, such as on a liquid barrier member. If allowed to evaporate and/or dry, these droplets may cause a problem such as uncontrolled heat loading of the apparatus and/or staining of the surface. An electrode set is provided on a surface where the droplets are likely to be formed. A controlled voltage is applied to the electrodes within the electrode set in order to electrostatically remove the droplets from the surface. |
申请公布号 |
US8279396(B2) |
申请公布日期 |
2012.10.02 |
申请号 |
US20080292964 |
申请日期 |
2008.12.01 |
申请人 |
TEN KATE NICOLAAS;VENEMA WILLEM JURRIANUS;VAN DER HAM RONALD;ASML NETHERLANDS B.V. |
发明人 |
TEN KATE NICOLAAS;VENEMA WILLEM JURRIANUS;VAN DER HAM RONALD |
分类号 |
G03B27/52;G03B27/32 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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