发明名称 |
Method for fabricating a thin film transistor array substrate with a thinned protective film over a storage capacitor |
摘要 |
A thin film transistor array substrate and a fabricating method are disclosed. A gate line and a data line cross each other and a thin film transistor (TFT) is provided at the intersection between the gate and data lines. A protective film covers the data line and the thin film transistor and has a contact hole exposing a drain electrode of the TFT. A pixel electrode is connected, via the contact hole, to the drain electrode of the TFT. A storage capacitor includes a gate insulating film between the pixel electrode and the gate line and/or a common line. Some or all of the protective film within the storage capacitor is removed such that the storage capacitor contains no protective film or a layer of protective film that is thinner than the portion covering the TFT. |
申请公布号 |
US8278161(B2) |
申请公布日期 |
2012.10.02 |
申请号 |
US20080019063 |
申请日期 |
2008.01.24 |
申请人 |
KIM SUNG JIN;CHOI WOO YOUNG;LG DISPLAY CO., LTD. |
发明人 |
KIM SUNG JIN;CHOI WOO YOUNG |
分类号 |
H01L21/32;H01L21/335 |
主分类号 |
H01L21/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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