发明名称 Method for fabricating a thin film transistor array substrate with a thinned protective film over a storage capacitor
摘要 A thin film transistor array substrate and a fabricating method are disclosed. A gate line and a data line cross each other and a thin film transistor (TFT) is provided at the intersection between the gate and data lines. A protective film covers the data line and the thin film transistor and has a contact hole exposing a drain electrode of the TFT. A pixel electrode is connected, via the contact hole, to the drain electrode of the TFT. A storage capacitor includes a gate insulating film between the pixel electrode and the gate line and/or a common line. Some or all of the protective film within the storage capacitor is removed such that the storage capacitor contains no protective film or a layer of protective film that is thinner than the portion covering the TFT.
申请公布号 US8278161(B2) 申请公布日期 2012.10.02
申请号 US20080019063 申请日期 2008.01.24
申请人 KIM SUNG JIN;CHOI WOO YOUNG;LG DISPLAY CO., LTD. 发明人 KIM SUNG JIN;CHOI WOO YOUNG
分类号 H01L21/32;H01L21/335 主分类号 H01L21/32
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