发明名称 Method and system detecting metal line failure
摘要 In a method of detecting metal line failures for a full-chip, a first net-list is converted to a second net-list. The first net-list includes first information related to elements and metal lines, and the second net-list includes second information susceptible to direct current analysis. Current densities of the metal lines are calculated by performing the direct current analysis on the second net-list. Defective metal lines among the metal lines are detected based on the current densities of the metal lines.
申请公布号 US8281268(B2) 申请公布日期 2012.10.02
申请号 US20090635873 申请日期 2009.12.11
申请人 YANG GI-YOUNG;KIM SE-YOUNG;SAMSUNG ELECTRONICS CO., LTD. 发明人 YANG GI-YOUNG;KIM SE-YOUNG
分类号 G06F17/50 主分类号 G06F17/50
代理机构 代理人
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