发明名称 |
Method and system detecting metal line failure |
摘要 |
In a method of detecting metal line failures for a full-chip, a first net-list is converted to a second net-list. The first net-list includes first information related to elements and metal lines, and the second net-list includes second information susceptible to direct current analysis. Current densities of the metal lines are calculated by performing the direct current analysis on the second net-list. Defective metal lines among the metal lines are detected based on the current densities of the metal lines. |
申请公布号 |
US8281268(B2) |
申请公布日期 |
2012.10.02 |
申请号 |
US20090635873 |
申请日期 |
2009.12.11 |
申请人 |
YANG GI-YOUNG;KIM SE-YOUNG;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YANG GI-YOUNG;KIM SE-YOUNG |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|