发明名称 Salt and photoresist composition containing the same
摘要 A salt represented by the formula (I-BB): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., B2 represents a C4-C36 alicyclic hydrocarbon group which has one or more —OXa groups and which is not capable of being eliminated by the action of an acid etc., and Xa represents a hydrogen atom or a group capable of being eliminated by the action of an acid, m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3.
申请公布号 US8278023(B2) 申请公布日期 2012.10.02
申请号 US20100786726 申请日期 2010.05.25
申请人 ICHIKAWA KOJI;SUGIHARA MASAKO;MASUYAMA TATSURO;SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 ICHIKAWA KOJI;SUGIHARA MASAKO;MASUYAMA TATSURO
分类号 G03F7/004;C07C309/00;G03F7/30 主分类号 G03F7/004
代理机构 代理人
主权项
地址