发明名称 Semiconductor device and manufacturing method thereof
摘要 Disclosed is a semiconductor device comprising: a semiconductor substrate in which an integrated circuit is formed; a first resin film provided over the semiconductor substrate; a second resin film provided over an upper surface of the first resin film except at least a peripheral portion of the first resin film; and a thin film inductor provided over the second resin film.
申请公布号 US8278734(B2) 申请公布日期 2012.10.02
申请号 US20100729558 申请日期 2010.03.23
申请人 MIHARA ICHIRO;TERAMIKROS, INC. 发明人 MIHARA ICHIRO
分类号 H01L27/08 主分类号 H01L27/08
代理机构 代理人
主权项
地址