Plasma generation device, plasma control method, and substrate manufacturing method,申请号KR20117019924-传众专利搜索

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发明名称	Plasma generation device, plasma control method, and substrate manufacturing method
摘要
申请公布号	KR101186822(B1)	申请公布日期	2012.09.28
申请号	KR20117019924	申请日期	2003.12.12
申请人		发明人
分类号	H01L21/205;C23C14/54;G02F1/13;H01J37/32;H05H1/46	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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