发明名称 |
DEFLECTION MIRROR AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING SUCH A DEFLECTION MIRROR |
摘要 |
<p>The invention relates to a deflection mirror for a microlithography projection exposure apparatus for illuminating an object field in an object plane of the projection exposure apparatus using the deflection mirror with grazing incidence. Said deflection mirror consists of a substrate and at least one layer system, and during operation light impinges on said mirror at a multiplicity of angles of incidence, wherein the layer system is designed such that, for light having a wavelength of less than 30 nm, for an angle of incidence of between 55° and 70°, the variation of the reflectivity is less than 20%, in particular less than 12%.</p> |
申请公布号 |
WO2012126867(A1) |
申请公布日期 |
2012.09.27 |
申请号 |
WO2012EP54752 |
申请日期 |
2012.03.19 |
申请人 |
CARL ZEISS SMT GMBH;ENKISCH, HARTMUT;MUELLENDER, STEPHAN;ENDRES, MARTIN |
发明人 |
ENKISCH, HARTMUT;MUELLENDER, STEPHAN;ENDRES, MARTIN |
分类号 |
G02B17/06;G21K1/06 |
主分类号 |
G02B17/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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