| 摘要 |
FIELD: nanotechnologies. ^ SUBSTANCE: invention relates to self-assembling sublithographic nanosized structures in an orderly periodical grid and to methods of their manufacturing. The concept of manufacturing is as follows: the method to form a nanosized pattern on a substrate includes formation of the first stenciled layer, covering the specified area on the substrate, arrangement of a system of first holes in it, each of which has a shape of a rectangular hexagon and which are arranged in cells of the first hexagonal grid, formation of the first nanosized self-assembled self-built structures in the first holes, formation of the second stenciled layer covering the specified section, arrangement of a system of second holes in the second stenciled layer, each of which has a shape of regular hexagon and which are arranged in cells of the second hexagonal grid, formation of the second nanosized self-assembled self-built structures in the second holes, formation of the third stenciled layer covering the specified section, arrangement of a system of third holes in the third stenciled layer, every of which has a shape of regular hexagon, and which are arranged in cells of the third hexagonal grid, and formation of the third nanosize self-assembled self-built structures in third holes. ^ EFFECT: invention makes it possible to produce a nanosized self-assembled self-built structure that would stretch on a section of larger area. ^ 21 cl, 33 dwg |
