| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an evaporation source and vapor-deposition apparatus, which can block radiation heat of a crucible and prevents a nozzle from being clogged. <P>SOLUTION: The evaporation source 1 includes: the nozzle 12 that is provided to project from the crucible 5 for heating and evaporating a vapor-deposition material M and that jets the material M thus evaporated toward a substrate; a reflector that has a plurality of metal plates 15 arranged in parallel, wherein among the plurality of metal plates 15, the one closest to the substrate is provided in a position closer to the substrate than an apical surface 13 of the nozzle 12; and a cover member 8 integrally configured with some of the plurality of metal plate 15 that form the reflector, and shielding a portion between the nozzle 12 and the reflector. <P>COPYRIGHT: (C)2012,JPO&INPIT |
