| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a curable composition for nanoimprint which can be used in nanoimprint and exhibits excellent resist development properties and etching resistance, and to provide a resist film using it. <P>SOLUTION: The curable composition for nanoimprint contains polysiloxane segment having a silanol group and/or a hydrolyzable silyl group, and a polymerizable double bond, and a composite resin having a polymer segment other than the polysiloxane. (In the formula, the carbon atom constitutes a portion of the vinyl based polymer segment, and the silicon atom bonded only to an oxygen atom constitutes a portion of the polysiloxane segment.) <P>COPYRIGHT: (C)2012,JPO&INPIT |
