| 发明名称 |
CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION AND CHEMICAL MECHANICAL POLISHING METHOD USING SAME |
| 摘要 |
<p>A chemical mechanical poiihing aqueous dispersion Includes (A) silica particles that include at least one functional group selected from the group consisting of. a sulfo group or salts thereof, and (B) an acidic. compound</p> |
| 申请公布号 |
SG182790(A1) |
申请公布日期 |
2012.09.27 |
| 申请号 |
SG20120056248 |
申请日期 |
2011.01.17 |
| 申请人 |
JSR CORPORATION |
发明人 |
TAKEMURA, AKIHIRO;YOSHIO, KOUHEI;YAMANAKA, TATSUYA;KONNO, TOMOHISA |
| 分类号 |
B24B37/04 |
主分类号 |
B24B37/04 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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