发明名称 LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM
摘要 <p>LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUMA liquid processing apparatus processes an object to be processed W including a body part W, and a plurality of projecting-shape parts Wm disposed on the body part W,, with an inorganic film and a different film being laminated to each other. The liquid processing apparatus comprises: a support part 50 configured to support the body part Wi; a hydrophobic-liquid supply mechanism 30 configured to supply a hydrophobic liquid to the object to be processed W; and a rinse-liquid supply part 22 configured to supply a rinse liquid to the object to be processed W to which the hydrophobic liquid has been supplied. The hydrophobic-liquid supply mechanism 30 includes: a first hydrophobic-liquid supply part 32 configured to supply a first hydrophobic liquid for making hydrophobic the inorganic film; and a second hydrophobic-liquid supply part 37 configured to supply a second hydrophobic liquid for making hydrophobic the different film.FIG. 2</p>
申请公布号 SG183693(A1) 申请公布日期 2012.09.27
申请号 SG20120058012 申请日期 2010.06.01
申请人 TOKYO ELECTRON LIMITED 发明人 MITSUNORI NAKAMORI;AKIRA FUJITA;TAKAYUKI TOSHIMA
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