| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a silicon substrate inspection device for precisely inspecting a defect, such as crack, in a silicon substrate, and to provide an inspection method thereof. <P>SOLUTION: The silicon substrate inspection device includes: a first linear polarization filter 3 provided in a light path between infrared lighting means 1 and a silicon substrate 5 to emit a linear polarization component 4; first and second imaging means 9 and 11 for imaging a linear polarization component 4' having passed through the silicon substrate 5; a second linear polarization filter 8 provided in a light path between the silicon substrate 5 and the first imaging means 9 and having a polarization direction set parallel to a substrate surface of the silicon substrate 5; a third linear polarization filter 10 provided in a light path between the silicon substrate 5 and the second imaging means 11 and having a polarization direction set perpendicular to the substrate surface; and image processing means 12 for comparing and computing the image data input from the first imaging means 9 and image data input from the second imaging means 11. <P>COPYRIGHT: (C)2012,JPO&INPIT |
