发明名称 LITHOGRAPHIC APPARATUS AND STAGE SYSTEM
摘要 A stage system includes an object table constructed to hold an object, a short stroke actuator element constructed to displace the object table over a first range of movement, and a long stroke actuator element constructed to displace the short stroke actuator element over a second range of movement which is larger than the first range of movement. The stage system further includes a pneumatic compensation device including: a sensor arranged to measure a quantity representative of a pneumatic disturbance force on the short stroke actuator element, an actuator arranged to provide a compensating force to at least partly compensate the pneumatic disturbance, and a controller. The sensor is connected to a controller input of the controller, the actuator is connected to a controller output of the controller, the controller being arranged to drive the actuator in response to a signal received from the sensor.
申请公布号 US2012242271(A1) 申请公布日期 2012.09.27
申请号 US201213403706 申请日期 2012.02.23
申请人 ASML NETHERLANDS B.V. 发明人 VAN DER TOORN JAN-GERARD CORNELIS;BAGGEN MARCEL KOENRAAD MARIE;KRUIJSWIJK STEFAN GEERTE;STARREVELD JEROEN PIETER;VERVOORDELDONK MICHAEL JOHANNES;BAGGEN MARK CONSTANT JOHANNES
分类号 G05B13/02;H02K41/02 主分类号 G05B13/02
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