发明名称 EXPOSURE DEVICE, EXPOSURE METHOD AND METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To set an exposure interval independent of a resolution of drawing data and a period of a pulse signal of an encoder and reduce a deviation between an exposure interval determined by the resolution of the drawing data and an exposure interval determined by the period of the pulse signal of the encoder, thereby improving drawing accuracy. <P>SOLUTION: An exposure device includes an encoder 32 for outputting a pulse signal according to a relative moving distance between a chuck 10 and a light beam irradiation device 20, and detects the relative moving distance between the chuck 10 and the light beam irradiation device 20 based on the pulse signal from the encoder 32. The exposure device sets reference coordinates at a resolution finer than the resolution of the drawing data, calculates the exposure interval determined by the resolution of the drawing data and the exposure interval determined by the period of the pulse signal of the encoder 32 on the reference coordinates, for a targeted reference exposure interval, determines the position coordinates of the chuck 10, and supplies a drive circuit of the light beam irradiation deice 20 with the drawing data according to the position coordinates of the chuck 10. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012185433(A) 申请公布日期 2012.09.27
申请号 JP20110050028 申请日期 2011.03.08
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MOCHIZUKI MASAAKI;MAEDA YASUYUKI;KUDO SHINYA
分类号 G03F7/20;H01L21/68 主分类号 G03F7/20
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