| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma source and a film formation apparatus which allows plasma to be led to a longer way, and the outflow of a cathode material to be suppressed. <P>SOLUTION: The plasma source 1 comprises: a cathode 4 operable to emit plasma from its front face side; a backside magnet 5 placed on the rear face side of the cathode 4; and outer peripheral magnets 6 placed to surround the periphery of the cathode 4. The cathode 4 has a hollow portion 3 opening on the front face side thereof. In portions of the backside magnet 5 and outer peripheral magnets 6 facing the cathode 4, the backside magnet 5 and outer peripheral magnets 6 have the same magnetic pole. <P>COPYRIGHT: (C)2012,JPO&INPIT |
