| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition that can obtain a pattern having an excellent focus margin. <P>SOLUTION: A resist composition comprises: an iodonium salt having an anion represented by formula (IA); an acrylic resin which has an acid-labile group, and is insoluble or sparingly soluble in an aqueous alkali solution and can dissolve in an aqueous alkali solution by an action of an acid; and an acid generator. In formula (IA), R<SP POS="POST">1</SP>represents a hydrogen atom, an aliphatic hydrocarbon group having 1 to 12 carbon atoms, an alicyclic hydrocarbon group having 3 to 20 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms or an aralkyl group having 7 to 21 carbon atoms; R<SP POS="POST">2</SP>represents an aliphatic hydrocarbon group having 7 to 12 carbon atoms, an alicyclic hydrocarbon group having 7 to 20 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms or aralkyl group having 7 to 21 carbon atoms; and R<SP POS="POST">1</SP>and R<SP POS="POST">2</SP>may be bonded to form a C4-C20 nitrogen-containing ring with N. <P>COPYRIGHT: (C)2012,JPO&INPIT |
