发明名称 |
RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A radiation source for generating extreme ultraviolet radiation for a lithographic apparatus has a debris mitigation device comprising a nozzle arranged at or near an intermediate focus (IF) of the beam of radiation. The nozzle serves to direct a flow of gas (330) towards the radiation source or collector optic in order to deflect particulate debris (43) emitted by the radiation source.
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申请公布号 |
SG183434(A1) |
申请公布日期 |
2012.09.27 |
申请号 |
SG20120062014 |
申请日期 |
2011.01.31 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LABETSKI, DZMITRY;BANINE, VADIM;LOOPSTRA, ERIK;YAKUNIN, ANDREI |
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