ELECTROLYTIC COPPER FOIL FOR ELECTROMAGNETIC-WAVE SHIELDING, AND MANUFACTURING METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide an electrolytic copper foil which is suited to an electromagnetic-wave shielding conductive film used for the front panel of a plasma display panel (PDP) and has a surface treatment layer suitable for blackening treatment to be conducted thereafter.

SOLUTION: The electrolytic copper foil for electromagnetic-wave shielding has a treatment surface, wherein zinc deposition on copper foil S surface is 30-110 μg/dm2, chrome deposition on copper foil M surface is 25-50 μg/dm2and a ratio Cr(s)/Cr(m) of the chrome deposition (Cr(s)) on copper foil S surface to the chrome deposition (Cr(m)) on copper foil M surface is 0.5 to 1.8. In a method for producing the electrolytic copper foil for electromagnetic-wave shielding, a plating bath 2 for forming a barrier layer made mainly of zinc and a plating bath 3 for forming a rust preventive layer made mainly of chrome are used to form a zinc layer by electroplating and a chrome layer by electroplating or immersion chromate method on the copper foil S surface, and to form a zinc layer by electroplating and a chrome layer by electroplating or immersion chromate method on the copper foil M surface.

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